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2:27
CNBC
EUV machines are key source of leverage for U.S. over China in AI race, says CSIS’s Gregory Allen
Gregory Allen, senior adviser with the Wadhwani AI Center at the Center for Strategic and International Studies, joins 'Money Movers' to discuss China's chip manufacturing effort, the U.S. plan to impose tariffs on Chinese chips, and more.
1 month ago
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Aug 2, 2022
7.8K views · 172 reactions | What role does the reticle stage play in High NA extreme ultraviolet (EUV) lithography? In this video, learn how the reticle stage enables patterning in advanced chipmaking. You’ll see how 13.5 nanometer EUV light reflected into the system gets shaped by the illuminator and how a chip pattern gets encoded into the light for lithography. | ASML | Facebook
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2 weeks ago
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