PEBBLE BEACH, Calif.–The shift towards sub-90-nm technologies could pose some new and major problems for IC makers, including a possible delay of 157-nm tools at the 65-nm (0.065-micron) node, warned ...
SANTA CLARA, Calif.–During the SPIE Microlithography conference here this week, researchers from the University of New Mexico will claim that they have simulated 22-nm half-pitch lines, by deploying ...
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